发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device including a field effect transistor which has a low Schottky barrier between source/drain electrodes and a semiconductor layer. SOLUTION: On a substrate 10, a semiconductor carbon nanotube 12 is formed. The source and the drain 13 are formed on the carbon nanotube 12 side. The source and the drain 13 include a metal carbide 15 formed in contact with the side face of the carbon nanotube 12 and a metal electrode 14 formed on the metal carbide. Between the source and the drain on the carbon nanotube, a gate insulation film 16 and a gate electrode 17 are stacked. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006245127(A) 申请公布日期 2006.09.14
申请号 JP20050056276 申请日期 2005.03.01
申请人 TOSHIBA CORP 发明人 YAGISHITA JUNJI
分类号 H01L29/786;H01L21/28;H01L29/06;H01L29/417 主分类号 H01L29/786
代理机构 代理人
主权项
地址