| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming apparatus or the like having a miniaturized and simplified adjustment mechanism and control mechanism and capable of forming a pattern with high precision and high efficiency. SOLUTION: A head unit 3 of the pattern forming apparatus 1 is provided with a head 9 for processing a substrate 105, a base 7 on which the head 9 is arranged, a movement mechanism 15 for mounting the head 9 to the base 7 individually movable and detachable, a driving mechanism 27 for giving a driving force to move the head 9 to the base 7, a length measurement mechanism 23 for measuring the position or the moving amount or the like of each head 9 to the base 7. COPYRIGHT: (C)2006,JPO&NCIPI
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