Mesostructured film, mesoporous material film, and production methods for the same

摘要

A mesostructured film is provided having a structure in which surfactant molecular assemblies are regularly arranged three-dimensionally. A polymer compound thin film is formed on the substrate surface through spin coating or the like, and a rotating roller wrapped with a cloth is pressed against the polymer film for rubbing in one direction. The polymer material includes polyimide, polyamide, and polystyrene. The substrate includes a silica glass substrate and a silicon substrate. The mesostructured film can be formed by retaining the substrate in an aqueous solution containing a surfactant, silicon alkoxide, and acid. After being retained in the solution, the substrate is heated at about 60 to 120° C. for several hours to several days for reaction. The surfactant includes C₁₈H₃₇ (OCH₂CH₂)₂₀ 0 H and C₁₆H₃₃ (OCH₂CH₂) ₂₀ 0 H. The alkoxide included tetraethoxysilane, tetramethoxysilane, and tetrapropoxysilane. Hydrochloric acid, nitric acid, or sulfuric acid is used as a catalyst.