| 摘要 |
PROBLEM TO BE SOLVED: To provide a lamp heating device for ideal temperature control with various works including a silicon wafer, even with works of large size and large difference in scale of rough. SOLUTION: The lamp heating device comprises a work placement holder on which a work is placed, a heating lamp provided with a heating lamp arranged on such surface as faces the work placement holder, and a driving part for changing relative position between the work placement holder and the heating lamp. The heating lamp is the lamp heating device that heats the work while changing relative position by the driving part. A heating process managing means and a temperature sensor are used for relative movement to provide a feedback effect, allowing better heating. COPYRIGHT: (C)2006,JPO&NCIPI
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