| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a film free from unevenness on the surface and nonuniformity of characteristics within the surface, by uniformizing a gas flow containing raw fine particles spouted from a nozzle without using an opening pattern mask. SOLUTION: The film-forming method comprises accelerating the flow of a gas 1 containing the raw fine particles by passing it through a fine nozzle 15, introducing the gas into a pressure-reduced chamber 14, and colliding the raw fine particles with a substrate 4 arranged in the pressure-reduced chamber to form the film of fine particles on the substrate 4. The film-forming apparatus has a second spray nozzle 6 for spraying the gas containing no raw fine particles juxtaposed in the vicinity of a first spray nozzle 5 for spouting the gas containing the raw fine particles. The film-forming method also includes passing the gas 7 spouted from the second spray nozzle 6 so as to be adjacent to the gas flow 3 containing the raw fine particles spouted from the first spray nozzle, and thereby reducing a difference of flow rates between the gas flows 3a and 3b respectively in a central part and a peripheral part of the gas flow 3 containing the raw fine particles. COPYRIGHT: (C)2006,JPO&NCIPI
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