发明名称 PHOTO-CURABLE COMPOSITION AND PHOTO-CURABLE COMPOUND
摘要 PROBLEM TO BE SOLVED: To provide a photo-curable composition comprising no aromatic compound which expresses high curability without using a photoinitiator and is cured to a cured form, and thereby exhibits the lowering of the blocking of the curing reaction by oxygen and thus has satisfactory hardness and satisfactory solvent resistance. SOLUTION: This photo-curable composition comprises a resin (A) having an acryloyl group and a chemical structure element represented by Structural Formula I: wherein R<SB>1</SB>and R<SB>2</SB>independently represent an alkyl or cycloalkyl group having a carbon number of 1 to 6; X<SB>1</SB>represents a carbonyl group or a cyano group; R<SB>4</SB>represents an alkyl or alkoxy group having a carbon number of 1 to 8; n is 1 when X<SB>1</SB>is a carbonyl group, or 0 when X<SB>1</SB>is a cyano group; R<SB>3</SB>represents an alkylene group having a carbon number of 1 to 3; and X<SB>2</SB>represents an electron-attracting group. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006241461(A) 申请公布日期 2006.09.14
申请号 JP20060057802 申请日期 2006.03.03
申请人 DAINIPPON INK & CHEM INC 发明人 FERBITZ JENS;LACHOWICZ ARTUR;GAUDL KAI-UWE
分类号 C08F20/26;C09D4/00;C09D4/02 主分类号 C08F20/26
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