| 摘要 |
<p>A transparent conductive laminate in which a crystalline transparent conductive film substantially made of In-Sn-O on a transparent substrate composed of a thermoplastic polymer film, is provided. The crystalline part of the transparent conductive film (ITO-film) has a specific crystalline structure in which the X-ray diffraction intensity from (222) crystal plane or (440) crystal plane is highest, and X440/222, the ratio of the X-ray diffraction intensity from the (440) crystal plane to that from the (222) crystal plane, is within the range of 0.2 to 2.5. The laminate has a low resistivity, and it is useful as an electrode material for a liquid crystal display, an electroluminescence device, a touch panel or the like. The transparent conductive laminate can be manufactured by combining the control of film fabricating atmosphere during sputtering and a heat treatment under specific conditions after film fabricating. <IMAGE></p> |
