A method for manufacturing phase shift mask of semiconductor device,申请号KR20000034897-传众专利搜索

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发明名称	A method for manufacturing phase shift mask of semiconductor device
摘要
申请公布号	KR100620652(B1)	申请公布日期	2006.09.13
申请号	KR20000034897	申请日期	2000.06.23
申请人		发明人
分类号	H01L21/027;G03F1/00	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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