| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a heat-treating apparatus that can heat and cool a substrate while the substrate is being conveyed, has high throughput, and can suppress irregularities when heating and cooling the substrate. <P>SOLUTION: A post bake zone (POB) 56 that is an example of the heat-treating apparatus comprises a substrate conveyance mechanism 71 for conveying the substrate G horizontally; and a plurality of panel-shaped heaters 72 arranged at a prescribed height position on a conveyance route of the substrate G by the substrate conveyance mechanism 71, while a gap 73 is provided at a prescribed interval along the conveyance route for heating the substrate G. The heater 72 comprises a plurality of small heaters 72a, 72b. The plurality of small heaters 72a, 72b are connected so that the joint is not in parallel with a substrate conveyance direction within a fixed distance range to prevent a transfer mark from occurring on the substrate G due to the joint of the plurality of small heaters 72a, 72b. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
