| 发明名称 |
IMPRINT LITHOGRAPHY TEMPLATES HAVING ALIGNMENT MARKS |
| 摘要 |
<p>One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template.</p> |
| 申请公布号 |
KR20060096998(A) |
申请公布日期 |
2006.09.13 |
| 申请号 |
KR20067005535 |
申请日期 |
2004.09.16 |
| 申请人 |
BOARD OF REGENTS , THE UNIVERSITY OF TEXAS SYSTEM |
发明人 |
BAILEY TODD C.;JOHNSON STEPHEN C.;COLBURN MATTHEW E.;CHOI BYUNG J.;SMITH BRITAIN J.;EKERDT JOHN G.;WILLSON CARLTON G.;SREENIVASAN SIDLGATA V. |
| 分类号 |
G03F7/00;G03F;G03F7/20;G03F9/00;H01L21/027 |
主分类号 |
G03F7/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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