发明名称 Liquid crystal alignment using electron beam exposure
摘要 An apparatus ( 10, 10'' ) for producing an alignment surface on an associated substrate ( 12, 12'' ) of a liquid crystal display. An electron source ( 40 ) produces a collimated electron beam ( 50 ). A substrate support ( 20, 20'' ) supports the associated substrate ( 12, 12'' ) with a surface normal ( 80 ) of the substrate arranged at a preselected angle (alpha) relative to the collimated electron beam ( 50 ). The collimated electron beam ( 50 ) is rastered across the associated substrate ( 12, 12'' ) at the preselected angle (alpha) while the substrate moves through the electron beam.
申请公布号 US7105845(B2) 申请公布日期 2006.09.12
申请号 US20040883871 申请日期 2004.07.02
申请人 KENT STATE UNIVERSITY 发明人 KUMAR SATYENDRA;VARGAS-ABURTO CARLOS;WANG QINGBING
分类号 A61N5/00;G21G5/00 主分类号 A61N5/00
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