发明名称 |
Universal spatial pattern recognition system |
摘要 |
A method and apparatus for analyzing patterns in semiconductor wafers wherein the patterns are compared to a plurality of patterns stored in a common pattern library. A spatial pattern recognition engine is operable to receive a first set of data corresponding to a pattern on a semiconductor wafer and to generate a normalized contour representation of said first data set. A pattern analyzer compares the normalized data set to a plurality of reference contour data sets stored in a common pattern data reference library and generates a correlation label associating the first data set with one of the plurality of reference contour data sets. The label associated with the first data set is stored in a label storage database that can be accessed to perform subsequent analysis on the data associated with a specific wafer. The system can be used to analyze multiple types of patterns, including defect data, bin data, positional parameter data and in-line site data.
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申请公布号 |
US7106897(B1) |
申请公布日期 |
2006.09.12 |
申请号 |
US20020134718 |
申请日期 |
2002.04.29 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
MCINTYRE MICHAEL G.;MORRIS JAMES E. |
分类号 |
G06K9/00 |
主分类号 |
G06K9/00 |
代理机构 |
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