发明名称 RADIATION SENSITIVE RESIN COMPOSITION AND SPACER FOR LIQUID CRYSTAL DISPLAY
摘要 <p>To provide a radiation sensitive resin composition having high sensitivity and high resolution, giving a satisfactory spacer shape even under exposure energy of about <=1,200 J/M<2>, and capable of forming spacers for a liquid crystal display element excellent in elastic recovery, rubbing resistance, adhesion to a substrate, heat resistance, etc.The radiation sensitive resin composition contains (A) a polymer obtained by reacting a copolymer ([alpha]) of an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, a hydroxyl group-containing unsaturated compound and another unsaturated compound with a free isocyanato group-containing unsaturated compound ([beta]) obtained by reacting a diisocyanate compound represented by the formula (1): OCN-W-NCO with a hydroxyl group-containing polymerizable unsaturated compound. In the formula (1), W denotes a divalent group represented by one of formulae (i)-(ix) (where n is an integer of 1-12).</p>
申请公布号 KR20060096330(A) 申请公布日期 2006.09.11
申请号 KR20060019962 申请日期 2006.03.02
申请人 JSR CORPORATION 发明人 ICHINOHE DAIGO;KAJITA TORU
分类号 G03F7/038;G03F7/004 主分类号 G03F7/038
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