发明名称 |
Methods and systems for determining overlay error based on target image symmetry |
摘要 |
In systems and methods measure overlay error in semiconductor device manufacturing based on target image asymmetry. As a result, the advantages of using very small in-chip targets can be achieved, while their disadvantages are reduced or eliminated. Methods for determining overlay error based on measured asymmetry can be used with existing measurement tools and systems. These methods allow for improved manufacturing of semiconductor devices and similar devices formed from layers.
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申请公布号 |
US2006197950(A1) |
申请公布日期 |
2006.09.07 |
申请号 |
US20060360031 |
申请日期 |
2006.02.22 |
申请人 |
SMITH NIGEL P;KU YI-SHA;PANG HSIU-LAN |
发明人 |
SMITH NIGEL P.;KU YI-SHA;PANG HSIU-LAN |
分类号 |
G01B11/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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