发明名称 SPIN COAT FILM FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a solid substrate for a sensor which has a coating film having small film thickness distribution and to provide the solid substrate for the sensor which has the coating film having small film thickness distribution. SOLUTION: The method for manufacturing the solid substrate for the sensor having the coating film on the surface comprises forming the film by rotating the substrate to be formed with the film under the atmosphere of≥50 to≤100% in coating solvent vapor pressure with respect to the saturated pressure in spin coating, thereby forming the coating liquid on the substrate to be formed with the film as a thin film. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006231261(A) 申请公布日期 2006.09.07
申请号 JP20050052417 申请日期 2005.02.28
申请人 FUJI PHOTO FILM CO LTD 发明人 SAITO YOSHIHIRO;HAKAMATA MASASHI
分类号 B05D1/40;B05D3/04;B32B15/08;G01N21/27;G01N33/543 主分类号 B05D1/40
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