发明名称 |
SPIN COAT FILM FORMING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a solid substrate for a sensor which has a coating film having small film thickness distribution and to provide the solid substrate for the sensor which has the coating film having small film thickness distribution. SOLUTION: The method for manufacturing the solid substrate for the sensor having the coating film on the surface comprises forming the film by rotating the substrate to be formed with the film under the atmosphere of≥50 to≤100% in coating solvent vapor pressure with respect to the saturated pressure in spin coating, thereby forming the coating liquid on the substrate to be formed with the film as a thin film. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006231261(A) |
申请公布日期 |
2006.09.07 |
申请号 |
JP20050052417 |
申请日期 |
2005.02.28 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
SAITO YOSHIHIRO;HAKAMATA MASASHI |
分类号 |
B05D1/40;B05D3/04;B32B15/08;G01N21/27;G01N33/543 |
主分类号 |
B05D1/40 |
代理机构 |
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地址 |
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