HYDROTHERMAL DECOMPOSITION APPARATUS AND METHOD FOR DISCHARGING RESIDUE

摘要

PROBLEM TO BE SOLVED: To provide a residue discharge apparatus for safely discharging residues precipitated in a reaction vessel of a hydrothermal treatment apparatus. SOLUTION: The hydrothermal decomposition apparatus 1 is a hydrothermal decomposition apparatus equipped with a reaction vessel 101 for hydrothermally treating PCB and a substance containing PCB at a temperature as high as 300°C or higher and a pressure as high as 22 MPa or higher. A residue discharge apparatus 3 for discharging the residues from the reaction vessel 101 in high-temperature and high-pressure state is installed in the apparatus 1 while being connected to the bottom part of the reaction vessel 101. COPYRIGHT: (C)2006,JPO&NCIPI