| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate stand for a film deposition apparatus with which bias voltage can be widely applied to the whole body of a substrate, and further, the generation of impurities can be prevented and which enables the wear thereof to be prevented, and to provide a film deposition apparatus a film deposition method. SOLUTION: The substrate stand for a film deposition apparatus is provided with: a holding stand 1 having a holding face which is composed of an insulator and holds the substrate; electrode pieces 2 arranged so as to be exposed to the holding face of the holding stand 1; and conductors 9 passing through the inside of the holding stand 1 and connected to the electrode pieces 2. COPYRIGHT: (C)2006,JPO&NCIPI
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