| 摘要 |
A method of producing an address plate comprising the steps of, coating a layer of conducting inorganic material onto a substrate, coating a layer of photoresist above this layer of conductive material and curing this layer, exposing, through a mask, the desired pattern of the conductors onto the layer of photoresist, developing the photoresist and etching the layer of the conductive material and coating the resulting etched layer with a layer of dielectric material. A further layer of photoresist is then applied, the thickness of this layer being equal to the desired height of a relief pattern, curing the further layer of photoresist, exposing, through a second mask, the desired structure of the relief pattern onto the layer of photoresist, developing the photoresist and allowing the layer to dry. This results in spacers raised above the layer of dielectric material.
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