发明名称 |
Organic film vapor deposition method and a scintillator panel |
摘要 |
An organic film vapor deposition method includes a first step of supporting a substrate formed with a scintillator on at least three protrusions of a target-support element disposed on a vapor deposition table so as to keep a distance from the vapor deposition table; a second step of introducing the vapor deposition table having the substrate supported by the target-support element into a vapor deposition chamber of a CVD apparatus; and a third step of depositing an organic film by CVD method onto all surfaces of the substrate, provided with the scintillator, introduced into the vapor deposition chamber.
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申请公布号 |
US2006197035(A1) |
申请公布日期 |
2006.09.07 |
申请号 |
US20060389028 |
申请日期 |
2006.03.27 |
申请人 |
HAMAMATSU PHOTONICS K.K. |
发明人 |
HOMME TAKUYA;TAKABAYASHI TOSHIO;SATO HIROTO |
分类号 |
G21K4/00;B05D7/24;C08L67/02;C23C16/00;C30B25/02;C30B29/12;C30B29/54;C30B33/00;G01T1/00;G01T1/20 |
主分类号 |
G21K4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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