发明名称 Imprint lithography
摘要 An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.
申请公布号 US2006196377(A1) 申请公布日期 2006.09.07
申请号 US20050072686 申请日期 2005.03.07
申请人 ASML NETHERLANDS B.V. 发明人 LOOPSTRA ERIK R.;KOLESNYCHENKO ALEKSEY Y.;SANTEN HELMAR V.
分类号 B41F33/00;B81C99/00 主分类号 B41F33/00
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