发明名称 Chromatographic methods for measuring impurities in a gas sample
摘要 The present invention provides an improved chromatographic system and an improved chromatographic method for measuring impurities in a gas sample that advantageously allow to extract a peak of impurity masked by the sample background. The method extracts an impurities peak from the sample background and put it in a second sample loop. Then, this second sample loop volume is injected into a second separation column. In fact, the system takes a "slice" from the sample background and fills the second sample loop with it. Then, the "slice", whose width is advantageously substantially equal to the impurities peak width, is injected in the second separation column. In a further preferred embodiment, the method also advantageously allows to concentrate a predetermined impurity, thereby providing an improved precision on the results. The chromatographic method advantageously provides an improved measure of argon in oxygen, oxygen in argon and oxygen in hydrogen.
申请公布号 US2006196247(A1) 申请公布日期 2006.09.07
申请号 US20060361068 申请日期 2006.02.22
申请人 SYSTEME ANALYTIQUE INC. 发明人 GAMACHE YVES;FORTIER ANDRE
分类号 G01N30/04 主分类号 G01N30/04
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