发明名称 |
Method of fabricating polishing pad having detection window thereon |
摘要 |
The present invention provides a polishing pad. The polishing pad comprises a transparent part and a high molecular weight layer. The transparent part has an uneven side surface and the profile of the uneven side surface is selected from a group consisting of a serrated shape, a wavy shape and a toothed shape. The high molecular weight layer encircles the transparent part.
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申请公布号 |
US2006198992(A1) |
申请公布日期 |
2006.09.07 |
申请号 |
US20060410756 |
申请日期 |
2006.04.24 |
申请人 |
SHIH WEN-CHANG;CHANG YUNG-CHUNG;CHU MIN-KUEI;WEI LUNG-CHEN |
发明人 |
SHIH WEN-CHANG;CHANG YUNG-CHUNG;CHU MIN-KUEI;WEI LUNG-CHEN |
分类号 |
B32B1/00;B29C44/12;B32B3/26 |
主分类号 |
B32B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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