| 摘要 |
PROBLEM TO BE SOLVED: To solve problems, wherein in a method for changing ion gun power supply application voltage in a conventional method for adjusting the frequency of a piezoelectric device, rate control is difficult in the case of a fine frequency adjusting rate, and thus the frequency of a piezoelectric diaphragm needs to be measured in each change of applied voltage, for instance, when a frequency adjusting process is performed in which the number of changes of application voltage in a single pallet, consisting of 200 piezoelectric devices is twice, frequency measurement of 600 times is required for accurate rate control and operability/productivity becomes very much deteriorated. SOLUTION: In the method for adjusting the frequency of a piezoelectric device by using an ion etching method, an ion-shielding plate for changing the quantity of ions radiated from an ion beam radiation port to quantity, corresponding to a required etching rate of an exciting electrode film, is arranged between the ion beam radiation port, and a mask plate arranged on the exciting electrode film formed on a piezoelectric diaphragm mounted on the piezoelectric device. COPYRIGHT: (C)2006,JPO&NCIPI
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