发明名称 |
Gas baffle and distributor for semiconductor processing chamber |
摘要 |
Techniques of the present invention are directed to distribution of deposition gases onto a substrate. In one embodiment, a gas distributor for use in a processing chamber is provided. The gas distributor includes a body having a gas deflecting surface and a gas distributor face. The gas deflecting surface defines a cleaning gas pathway. The gas distributor face is disposed on an opposite side of the body from the gas deflecting surface and faces toward a substrate support member. The gas distributor face includes a raised step and at least one set of apertures through the raised step. The at least one set of apertures are adapted to distribute a deposition gas over a substrate positioned on the substrate support member.
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申请公布号 |
US2006196603(A1) |
申请公布日期 |
2006.09.07 |
申请号 |
US20050075527 |
申请日期 |
2005.03.07 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LEI LAWRENCE C.;LU SIQING;GIANOULAKIS STEVEN E.;BANG WON B.;SUN DAVID P.;VICTOR WANG YEN-KUN |
分类号 |
C23F1/00;C23C16/00;H01L21/306 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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