发明名称 |
Model-based SRAF insertion |
摘要 |
A system for producing mask layout data retrieves target layout data defining a pattern of features, or portion thereof and an optimized mask layout pattern that includes a number of printing and non-printing features. Mask layout data for one or more subresolution assist features (SRAFs) is then defined to approximate one or more non-printing features of the optimized mask layout pattern.
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申请公布号 |
US2006200790(A1) |
申请公布日期 |
2006.09.07 |
申请号 |
US20050241732 |
申请日期 |
2005.09.30 |
申请人 |
SHANG SHUMAY D;SWALLOW LISA;GRANIK YURI |
发明人 |
SHANG SHUMAY D.;SWALLOW LISA;GRANIK YURI |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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