发明名称 |
Phase Shift Photomask and Method for Improving Printability of a Structure on a Wafer |
摘要 |
A phase shift photomask and method for improving printability of a structure on a wafer are disclosed. The method includes providing a photomask including a zero degree PSW formed on a top surface of a substrate and a 180 degree PSW formed in a first region of the substrate. An orthogonal PSW that facilitates projection of an increased intensity of radiant energy through a second region of the substrate during a lithography process is formed in the second region between the zero degree PSW and the 180 degree PSW.
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申请公布号 |
US2006199109(A1) |
申请公布日期 |
2006.09.07 |
申请号 |
US20060383378 |
申请日期 |
2006.05.15 |
申请人 |
NAKAGAWA KENT |
发明人 |
NAKAGAWA KENT |
分类号 |
B44C1/22;C23F1/00;G03C;G03C5/00;G03F1/00 |
主分类号 |
B44C1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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