发明名称 DEVICE AND METHOD FOR PATTERN CORRECTION
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a device and a method for pattern correction that can speedily correct a defect part and have good operability. <P>SOLUTION: This pattern correction device jets atomized correction liquid from a coating nozzle 30 to a white void defect part 13a that a colored layer 13 of a pixel PIX_B has while opening a shutter 31. The shutter 31 is closed after a proper amount of correction liquid 20a spreads all over the whose white voice defect part 13a. Consequently, it is not necessary to apply ink to a stylus each time ink is applied like a conventional stylus system, and the correction liquid can be deposited continuously on the white void defect part. The tact time needed for the defect correction can, therefore, be shortened. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006235313(A) 申请公布日期 2006.09.07
申请号 JP20050050768 申请日期 2005.02.25
申请人 NTN CORP 发明人 KOIKE TAKASHI;SHIMIZU SHIGEO
分类号 G02B5/20;G01M11/00;G01N21/956;H01J9/50;H01J11/02;H01J11/22;H01J11/34;H01J11/42;H01J11/44 主分类号 G02B5/20
代理机构 代理人
主权项
地址