| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film deposition apparatus having a compact structure capable of preventing re-pollution of a silicon substrate by integrating the laser cleaning function with the thin film deposition apparatus. SOLUTION: A supporting table carrying a silicon substrate 6 is arranged on an upper part in a vacuum chamber 2, and a sputtering apparatus 7 is arranged on a lower part thereof. A laser introducing cylindrical part 14 is provided on a side wall part of the vacuum chamber 2 downwardly in the diagonal direction. Laser beams oscillated from a laser beam irradiation unit 16 are applied on a lower side of the silicon substrate 6 arranged in a cleaning area through the laser beam introducing cylindrical part 14 to perform the cleaning. The silicon substrate 6 subjected to the cleaning is arranged in a thin film deposition area while turning the supporting table 3 by a driving device 5, and a thin film is deposited by the sputtering apparatus 7. COPYRIGHT: (C)2006,JPO&NCIPI
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