发明名称 SPUTTERING CATHODE AND SPUTTERING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a sputtering cathode and a sputtering system capable of obtaining a space-saving, compact and inexpensive cathode structure. SOLUTION: Reduction in size and cost is realized by installing a target on both sides of one cathode while, in the conventional system, one cathode is generally used for one target material. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006233240(A) 申请公布日期 2006.09.07
申请号 JP20050046009 申请日期 2005.02.22
申请人 CANON INC 发明人 SAWAMURA MITSUHARU
分类号 C23C14/34 主分类号 C23C14/34
代理机构 代理人
主权项
地址
您可能感兴趣的专利