发明名称 FILM DEPOSITION METHOD, PLASMA DISPLAY SUBSTRATE MANUFACTURING METHOD, AND PLASMA DISPLAY PANEL
摘要 PROBLEM TO BE SOLVED: To realize easy processing by omitting positioning of a mask and positioning of the laser scanning position when depositing a film deposition material layer only on a top of a bulkhead of a plasma display panel. SOLUTION: In a method in which a substrate having a bulkhead for film deposition is irradiated with laser beams, a film deposition material is ablated, and the material is thermal-sprayed on a top of the bulkhead, a dimensional difference of a space corresponding a pattern to be formed in advance between a target substrate consisting of the film deposition material and the top of the bulkhead of the substrate is formed, and a film deposition material layer is deposited on the top of the bulkhead by utilizing the difference of the conditions by the dimensional difference. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006233235(A) 申请公布日期 2006.09.07
申请号 JP20050045062 申请日期 2005.02.22
申请人 FUJITSU LTD;ADVANCED PDP DEVELOPMENT CORP 发明人 HASEGAWA MINORU;INOUE KAZUNORI
分类号 C23C14/28;C23C14/24;H01J9/02;H01J11/02;H01J11/22;H01J11/34;H01J11/36;H01J11/44 主分类号 C23C14/28
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