发明名称 |
FILM DEPOSITION METHOD, PLASMA DISPLAY SUBSTRATE MANUFACTURING METHOD, AND PLASMA DISPLAY PANEL |
摘要 |
PROBLEM TO BE SOLVED: To realize easy processing by omitting positioning of a mask and positioning of the laser scanning position when depositing a film deposition material layer only on a top of a bulkhead of a plasma display panel. SOLUTION: In a method in which a substrate having a bulkhead for film deposition is irradiated with laser beams, a film deposition material is ablated, and the material is thermal-sprayed on a top of the bulkhead, a dimensional difference of a space corresponding a pattern to be formed in advance between a target substrate consisting of the film deposition material and the top of the bulkhead of the substrate is formed, and a film deposition material layer is deposited on the top of the bulkhead by utilizing the difference of the conditions by the dimensional difference. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006233235(A) |
申请公布日期 |
2006.09.07 |
申请号 |
JP20050045062 |
申请日期 |
2005.02.22 |
申请人 |
FUJITSU LTD;ADVANCED PDP DEVELOPMENT CORP |
发明人 |
HASEGAWA MINORU;INOUE KAZUNORI |
分类号 |
C23C14/28;C23C14/24;H01J9/02;H01J11/02;H01J11/22;H01J11/34;H01J11/36;H01J11/44 |
主分类号 |
C23C14/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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