| 摘要 |
A method is provided of conditioning an atmosphere inside a chamber of an exposure apparatus in which an optical element is disposed for directing light to expose a substrate. The method includes the steps of supplying inert gas into the chamber and exhausting gas from the chamber. The supplying step adjusts the flow rate of the inert gas so that the amount of impurities supplied into the chamber is not greater than 2 nanograms per minute per 1 liter of a volume of the chamber.
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