HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING THE HYPERBRANCHED POLYMER

摘要

The present invention provides a hyperbranched polymer suitable as a polymer material for nanofabrication, in particular, photolithography. The hyperbranched polymer of the present invention is characterized by having a core portion prepared by a living radical polymerization of chloromethyl styrene or the like, and an acid decomposition group such as p-tert-butoxy styrene, which is linked to the core portion and present at the end of a molecule of the polymer.