| 发明名称 |
Ultraviolet ray generator, ultraviolet ray irradation processing apparatus, and semiconductor manufacturing system |
| 摘要 |
<p>The present invention relates to an ultraviolet ray generator 101, and the generator 101 has an ultraviolet ray lamp 1, a protective tube 2 being made of a material which is transparent with respect to ultraviolet ray and housing the ultraviolet ray lamp 1, and gas introduction port 6a introducing nitrogen gas or inert gas into the protective tube 2.
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| 申请公布号 |
EP1601003(A3) |
申请公布日期 |
2006.09.06 |
| 申请号 |
EP20050006546 |
申请日期 |
2005.03.24 |
| 申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY;SEMICONDUCTOR PROCESS LABORATORY CO., LTD. |
发明人 |
OHDAIRA, TOSHIYUKI;SHIOYA, YOSHIMI |
| 分类号 |
H01J61/34;H01L21/31;C23C16/40;C23C16/56;F27B17/00;F27D99/00;H01J61/04;H01J61/50;H01J61/52;H01J65/04;H01L21/00 |
主分类号 |
H01J61/34 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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