发明名称 |
EXPOSURE APPARATUS AND EXPOSURE METHOD |
摘要 |
An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy. |
申请公布号 |
EP1699072(A1) |
申请公布日期 |
2006.09.06 |
申请号 |
EP20040801655 |
申请日期 |
2004.12.03 |
申请人 |
NIKON CORPORATION |
发明人 |
NAGASAKA, HIROYUKI;TAKAIWA, HIROAKI;HIRUKAWA, SHIGERU;HOSHIKA, RYUICHI;ISHIZAWA, HITOSHI |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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