发明名称 Photocurable composition and photocurable compound
摘要 The invention is related to a photocurable composition containing a resin (A) having an acryloyl group and a chemical structure element represented by the following formula I, wherein R1 and R2 independently denote an alkyl or cycloalkyl group having a carbon number of 1 to 6, X1 denotes carbonyl group or cyano group, R4 denotes an alkyl or alkoxy group having carbon number of 1 to 8, n denotes 1 when X1 is carbonyl, and 0 when X1 is cyano group, R3 denotes an alkylene group having a carbon number of 1 to 4, and X2 denotes an electron attracting group. The photocurable composition exhibits, by irradiation of UV light or sunlight, higher curability without any additions of photoinitiators, and thereby gives good hardness such as solvent resistance to the cured products. Therefore, the composition of the present invention is suitable for coatings or moldings.
申请公布号 EP1698646(A1) 申请公布日期 2006.09.06
申请号 EP20050004802 申请日期 2005.03.04
申请人 DAINIPPON INK AND CHEMICALS, INC. 发明人 FERBITZ, JENS DR.;LACHOWICZ, ARTUR DR.;GAUDL, KAI-UWE DR.
分类号 C08F222/10;C08F236/00 主分类号 C08F222/10
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