发明名称 Positive resist composition and pattern-forming method using the same
摘要 <p>A positive resist composition, which comprises a resin having a structure showing a basicity and capable of increasing the solubility in an alkali developer by the action of an acid, and a pattern-forming method using the same.</p>
申请公布号 EP1698937(A2) 申请公布日期 2006.09.06
申请号 EP20060004404 申请日期 2006.03.03
申请人 FUJIFILM CORPORATION 发明人 KANDA, HIROMI
分类号 G03F7/039 主分类号 G03F7/039
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