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经营范围
发明名称
Method for surface treatment of silicon wafers for resistivity measurement
摘要
申请公布号
KR100620811(B1)
申请公布日期
2006.09.06
申请号
KR19990044267
申请日期
1999.10.13
申请人
发明人
分类号
H01L21/304
主分类号
H01L21/304
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代理人
主权项
地址
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