发明名称 |
Envelope follower end point detection in time division multiplexed processes |
摘要 |
The present invention provides a method and an apparatus for establishing endpoint during an alternating cyclical etch process or time division multiplexed process. A substrate is placed within a plasma chamber and subjected to an alternating cyclical process having an etching step and a deposition step. A variation in plasma emission intensity is monitored using known optical emission spectrometry techniques. An amplitude information is extracted from a complex waveform of the plasma emission intensity using an envelope follower algorithm. The alternating cyclical process is discontinued when endpoint is reached at a time that is based on the monitoring step.
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申请公布号 |
US7101805(B2) |
申请公布日期 |
2006.09.05 |
申请号 |
US20040841818 |
申请日期 |
2004.05.06 |
申请人 |
UNAXIS USA INC. |
发明人 |
JOHNSON DAVID;WESTERMAN RUSSELL |
分类号 |
H01L21/302;G01L21/30;H01J37/32;H01L21/3065;H01L21/66 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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