发明名称 COMPOSITE OPTICAL LITHOGRAPHY METHOD FOR PATTERNING LINES OF SIGNIFICANTLY DIFFERENT WIDTHS
摘要 <p>A composite patterning technique may include three lithography processes. A first lithography process forms a periodic pattern of alternating continuous lines of substantially equal width and spaces on a first photoresist. A second lithography process uses a non-interference lithography technique to break continuity of the patterned lines and form portions of desired integrated circuit features. The first photoresist may be developed. A second photoresist is formed over the first photoresist. A third lithography process uses a non-interference lithography technique to expose a pattern on the second photoresist and form remaining desired features of an integrated circuit pattern.</p>
申请公布号 KR20060096052(A) 申请公布日期 2006.09.05
申请号 KR20067007350 申请日期 2006.04.17
申请人 INTEL CORPORATION 发明人 BORODOVSKY YAN
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址