发明名称 Electron emission device and its method of fabrication
摘要 <p>In an electron emission device and its method of fabrication, a plurality of holes (211) are smoothly formed within a limited region, and an ohmic layer (207) connected to a signal line (204) is formed using some of the plurality of holes. The electron emission device includes: a substrate (201); a first electrode (203) arranged on the substrate; a first insulating layer (205) arranged on the first electrode and having a plurality of first holes (211); an ohmic layer (207) arranged in at least one of the plurality of first holes and electrically connected to the first electrode; a signal line (204) electrically connected to the ohmic layer and adapted to supply a voltage to the first electrode via the ohmic layer; an emitter arranged (215) in the plurality of first holes excluding the at least one hole having the ohmic layer arranged therein and electrically connected to the first electrode; and a second electrode (213) arranged on the first insulating layer and having a plurality of gate holes corresponding to the plurality of first holes excluding the at least one hole having the ohmic layer arranged therein.</p>
申请公布号 EP1696450(A2) 申请公布日期 2006.08.30
申请号 EP20060110015 申请日期 2006.02.16
申请人 SAMSUNG SDI CO., LTD. 发明人 LEE, SANG JIN
分类号 H01J1/304;H01J9/02 主分类号 H01J1/304
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