发明名称 Lithographic apparatus, apparatus cleaning method, and device manufacturing method
摘要 In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool. A laser may also be used for in situ cleaning of components of a lithographic projection apparatus,
申请公布号 EP1329773(A3) 申请公布日期 2006.08.30
申请号 EP20030250234 申请日期 2003.01.15
申请人 ASML NETHERLANDS B.V. 发明人 HEERENS, GERT-JAN;DONDERS, SJOERD NICOLAAS LAMBERTUS;SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES;VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES;CASTENMILLER, THOMAS JOSEPHUS MARIA
分类号 G03F7/20 主分类号 G03F7/20
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