发明名称 |
Lithographic apparatus, apparatus cleaning method, and device manufacturing method |
摘要 |
In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool. A laser may also be used for in situ cleaning of components of a lithographic projection apparatus, |
申请公布号 |
EP1329773(A3) |
申请公布日期 |
2006.08.30 |
申请号 |
EP20030250234 |
申请日期 |
2003.01.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HEERENS, GERT-JAN;DONDERS, SJOERD NICOLAAS LAMBERTUS;SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES;VAN MEER, ASCHWIN LODEWIJK HENDRICUS JOHANNES;CASTENMILLER, THOMAS JOSEPHUS MARIA |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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