发明名称 |
Lithographic apparatus with alignment subsystem, device manufacturing method using alignment, and alignment structure |
摘要 |
A lithographic apparatus comprising an alignment subsystem (21) for aligning the substrate (W) on the substrate table (WT) relative to the patterning means (MA). The alignment structure (10) comprises a non-periodic feature (15) which is detectable as a capture position or a check position using a reference grating (26) in the alignment subsystem (21). The non-periodic feature (15) may cause a phase effect in the detected signal of the alignment subsystem (21) or an amplitude effect.
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申请公布号 |
SG124270(A1) |
申请公布日期 |
2006.08.30 |
申请号 |
SG20030007497 |
申请日期 |
2003.12.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LEVASIER LEON MARTIN;BOEF DEN ARIE JEFFREY;DIRNSTORFER INGO;JEUNINK ANDRE BERNARDUS;KRUIJSWIJK STEFAN GEERTE;PELLEMANS HENRICUS PETRUS MARIA;SETIJA IRWAN DANI;TOLSMA HOITE PIETER THEODOOR |
分类号 |
G01B11/00;G03F7/20;G03F9/00;H01L21/027 |
主分类号 |
G01B11/00 |
代理机构 |
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主权项 |
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地址 |
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