发明名称 |
LITHOGRAPHY MEASUREMENT USING SCATTEROMETRY |
摘要 |
<p>A lithographic apparatus includes an illuminator configured to condition a beam of radiation and a support configured to hold a patterning device. The patterning device is configured to pattern the beam of radiation according to a desired pattern. The lithographic apparatus also includes a substrate table configured to hold a substrate and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate. The apparatus further includes a sensor configured and arranged to intercept a portion of the beam and to measure a transmission of the beam through at least a portion of the patterning device.</p> |
申请公布号 |
KR20060094892(A) |
申请公布日期 |
2006.08.30 |
申请号 |
KR20060017604 |
申请日期 |
2006.02.23 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN INGEN SCHENAU KOEN;JANSSEN MAURICE HENRICUS FRANCISCUS;KIERS ANTOINE GASTON MARIE;VAN DER LAAN HANS;VANOPPEN PETER CLEMENT PAUL |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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