METHOD FOR REPAIRING ERRORS OF PATTERNS EMBODIED IN THIN LAYERS

摘要

The correction of an erroneous design realised in a first thin layer comprising a first engraved sub-layer (120) with the erroneous design and at least one second sub-layer (110) situated between a substrate (100) and the first sub-layer, consists of: (A) deposition of a second thin layer (300) on the first thin layer; (B) the direct engraving in the second thin layer of the desired correction; (C) engraving the second sub-layer across the first sub-layer.