| 摘要 |
The gate bus lines, the data bus lines, TFTs, etc. are formed on one glass substrate. Also, linear structures arranged in parallel with the gate bus lines are formed simultaneously with any one of the gate bus lines and the data bus lines. Then, a positive resist film is formed over the substrate, and then only a surface layer is cured by irradiating the ultraviolet ray onto the resist film. Then, the annealing is applied to the resist film. Since the linear structures are present under the resist film, a cross section of the resist film is corrugated by the annealing and thus wrinkle-like roughness extending in the almost same direction as the structures are formed on the surface. Then, the reflective electrode is formed on the resist film.
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