发明名称 Gallium nitride crystal and method of making same
摘要 There is provided a GaN single crystal at least about 2 millimeters in diameter, with a dislocation density less than about 10<SUP>4 </SUP>cm<SUP>-1</SUP>, and having no tilt boundaries. A method of forming a GaN single crystal is also disclosed. The method includes providing a nucleation center, a GaN source material, and a GaN solvent in a chamber. The chamber is pressurized. First and second temperature distributions are generated in the chamber such that the solvent is supersaturated in the nucleation region of the chamber. The first and second temperature distributions have different temperature gradients within the chamber.
申请公布号 US7098487(B2) 申请公布日期 2006.08.29
申请号 US20020329981 申请日期 2002.12.27
申请人 GENERAL ELECTRIC COMPANY 发明人 D'EVELYN MARK PHILIP;PARK DONG-SIL;LEBOEUF STEVEN;ROWLAND LARRY;NARANG KRISTI;HONG HUICONG;SANDVIK PETER M.
分类号 C30B9/00;H01L33/32 主分类号 C30B9/00
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