In-line holographic mask for micromachining

摘要

A method of fabricating a holographic mask includes the steps of providing an illumination source and a non-opaque object mask. The source is for generating a coherent illumination beam directed along an axis. The object mask is capable of transmitting a portion of the illumination beam as undiffracted reference wavefronts. The object mask has one or more substantially transparent elements for creating overlapping object wavefronts when the illumination beam is incident thereon. The object mask is disposed in the illumination beam. A holographic recording medium is provided in the illumination beam in line optically with the object mask. The object mask is illuminated with the illumination beam, thereby causing the object mask to allow undiffracted reference wavefronts to pass therethrough. The illumination directed along the axis causes the one or more substantially transparent elements to create object wavefronts which interact with the undiffracted reference wavefronts to create an interference pattern.