发明名称 |
Method and apparatus for self-referenced projection lens distortion mapping |
摘要 |
A projection lens distortion error map is created using overlay targets and a special numerical algorithm. A reticle including an array of overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic stepper. After exposure, the overlay targets are measured for placement error. The resulting overlay error data is then supplied to a software program that generates a lens distortion error map for the photolithographic projection system.
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申请公布号 |
US7099011(B2) |
申请公布日期 |
2006.08.29 |
申请号 |
US20030727018 |
申请日期 |
2003.12.02 |
申请人 |
LITEL INSTRUMENTS |
发明人 |
MCARTHUR BRUCE;SMITH ADLAI;HUNTER, JR. ROBERT |
分类号 |
G01B11/00;G01B9/00;G02B27/00;G03B27/32;G03B27/42;G03F7/20;G03F9/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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