| 发明名称 |
OFF-AXIS PROJECTION OPTICS AND EXTREME ULTRA VIOLET LITHOGRAPHY APPARATUS APPLYING IT |
| 摘要 |
<p>Off-axis projection optics that includes first and second mirrors positioned off-axis and sharing a confocal point that are arranged to reduce linear astigmatism. If a distance between an object plane and the first mirror is l<SUB>1</SUB>, an incident angle of light coming from the object plane to the first mirror is i<SUB>1</SUB>, a distance between the first mirror and the confocal point is l<SUB>1</SUB>', a distance between the confocal point and the second mirror is l<SUB>2</SUB>, an incident angle of light coming from the first mirror to the second mirror is i<SUB>2</SUB>, and a distance between the second mirror and an image plane is l<SUB>2</SUB>', the off-axis projection optics may satisfy the following equation: <maths id="MATH-US-00001" num="00001"> <MATH OVERFLOW="SCROLL"> <MROW> <MROW> <MFRAC> <MROW> <MSUBSUP> <MI>l</MI> <MN>1</MN> <MI>'</MI> </MSUBSUP> <MO>+</MO> <MSUB> <MI>l</MI> <MN>1</MN> </MSUB> </MROW> <MSUB> <MI>l</MI> <MN>1</MN> </MSUB> </MFRAC> <MO></MO> <MI>tan</MI> <MO></MO> <MSTYLE> <mspace width="0.6em" height="0.6ex"/> </MSTYLE> <MO></MO> <MSUB> <MI>i</MI> <MN>1</MN> </MSUB> </MROW> <MO>=</MO> <MROW> <MFRAC> <MROW> <MSUBSUP> <MI>l</MI> <MN>2</MN> <MI>'</MI> </MSUBSUP> <MO>+</MO> <MSUB> <MI>l</MI> <MN>2</MN> </MSUB> </MROW> <MSUB> <MI>l</MI> <MN>2</MN> </MSUB> </MFRAC> <MO></MO> <MI>tan</MI> <MO></MO> <MSTYLE> <mspace width="0.6em" height="0.6ex"/> </MSTYLE> <MO></MO> <MROW> <MSUB> <MI>i</MI> <MN>2</MN> </MSUB> <MO>.</MO> </MROW> </MROW> </MROW> </MATH> </MATHS></p> |
| 申请公布号 |
KR20060093920(A) |
申请公布日期 |
2006.08.28 |
| 申请号 |
KR20050015051 |
申请日期 |
2005.02.23 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHANG, SEUNG HYUK;SONG, I HUN;KIM, WON JOO;KIM, SUK PIL;KIM, HOON |
| 分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
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