| 摘要 |
<p>An apparatus for controlling a semiconductor manufacturing process includes, a filter which receives from semiconductor processing devices first process parameters for processing a wafer and measured data obtained by measuring the wafer, and removes noise from the first process parameters and the measured data, a model generating unit which receives the first process parameters and the measured data from the filter and generates process models for predicting results of processing the wafer, a model selecting unit which selects a process model suitable for processing the wafer from a plurality of the process models stored in the model generating unit according to a received request, a process predicting unit which receives second process parameters for processing the wafer from the semiconductor processing devices, requests and receives the process model to and from the model selecting unit, and predicts a result of processing the wafer using the received process model, and a process controlling unit which receives the predicted result from the process predicting unit and controls the operations of the semiconductor processing devices.</p> |
